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Plasma Charging Damage Kin P. Cheung Softcover reprint of the original 1st ed. 2001 edition
Plasma Charging Damage
Kin P. Cheung
In the 50 years since the invention of transistor, silicon integrated circuit (IC) technology has made astonishing advances. In state of the art silicon Ie manufacturing process, plasma is used in more than 20 different critical steps.
364 pages, biography
| Medij | Knjige Paperback Book (Knjiga z mehkimi platnicami in lepljenim hrbtom) |
| Izdano | 30. avgusta 2012 |
| ISBN13 | 9781447110620 |
| Založniki | Springer London Ltd |
| Strani | 346 |
| Dimenzije | 157 × 234 × 19 mm · 522 g |
| Jezik | Angleščina |
Več od istega **izdajatelja**
Ogled vseh Kin P. Cheung ( Na primer Paperback Book in Hardcover Book )