Distributed  Agent Platform  for Adaptive Modeling  in Nanolithography - Marcin Sieniek - Knjige - LAP LAMBERT Academic Publishing - 9783659393006 - 10. maja 2013
Če se naslovnica in naslov ne ujemata, je naslov pravilen

Distributed Agent Platform for Adaptive Modeling in Nanolithography

Cena
€ 117,49

Naročeno iz oddaljenega skladišča

Predvidena dobava 19. - 27. okt
Prejemajte obvestila o novih izdajah izvajalca Marcin Sieniek
Dodaj na svoj seznam želja iMusic

Not rated yet

Adaptive systems for numerical computations with Finite Element Method or Finite Difference Method grow nowadays to great sizes. This is typically caused not only by the complexity of the actual algorithms involved, but also by the amount of additional routines required to deploy, manage and monitor applications in distributed environments. Moreover, most modeling problems require overwhelming resources and distribution is a must-have for any reasonably-sized application in this field. Researchers and developers implement this in a whole lot of ways, most of which have one thing in common ? the decisions about where and when a given piece of code should be executed are hard-coded entirely inside the application. The situation becomes even worse when it comes to adaptive algorithms where dynamic load-balancing is required. It is, again, often implemented as a part of a monolithic problem-specific code, which makes interaction with it a pain. The book discusses how to cope with the above problems, by employing the agent methodology in order to separate platform tasks from the application layer.

Medij Knjige     Paperback Book   (Knjiga z mehkimi platnicami in lepljenim hrbtom)
Izdano 10. maja 2013
ISBN13 9783659393006
Založniki LAP LAMBERT Academic Publishing
Strani 56
Dimenzije 150 × 3 × 225 mm   ·   102 g
Jezik Nemščina