Atomic Layer Deposition for Semiconductors -  - Knjige - Springer-Verlag New York Inc. - 9781489979438 - 23. avgusta 2016
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Atomic Layer Deposition for Semiconductors Softcover reprint of the original 1st ed. 2014 edition

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This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes.


273 pages, 89 black & white illustrations, 81 colour illustrations, 3 black & white tables, 1 colour

Medij Knjige     Paperback Book   (Knjiga z mehkimi platnicami in lepljenim hrbtom)
Izdano 23. avgusta 2016
ISBN13 9781489979438
Založniki Springer-Verlag New York Inc.
Strani 263
Dimenzije 234 × 155 × 18 mm   ·   482 g
Jezik Angleščina  
Urednik Hwang, Cheol Seong

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